arXiv preprint / cs.CV

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds

作者：Huanglong Ji, Botong Zhao, Shujing Lv, Yue Lv · 会议/期刊：arXiv preprint · 方向：cs.CV · 发布日期：2026-08-05

2026-08-05视觉语言数据集/基准
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LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds figure
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